Features:
- Ultra-high vacuum (UHV) or air operation.
- Highest surface sensitivity of any Kelvin Probe on the market.
- Non-damaging even to the most sensitive adsorbates.
- MS Windows menu-driven data acquisition software enables easy optimization of signal-to-noise ratio.
- Digital oscillator for taking data at a variety of frequencies and amplitudes
- 2¾ " (70mm) conflat flange mounting fits virtually any vacuum chamber.
- Flange-to-sample distance may be specified by user to fit any vacuum chamber.
- Available with optional linear translator for fine adjustment of sample-to-probe distance.
- Computer controlled backing potential reduces shielding problems.
- User-selectable tip size and/or geometry accommodates any sample dimensions.
- Wide range of applications such as UHV surface analysis, in situ process monitoring,kinetics, photo voltage studies and work function topographies.
- The Digital Kelvin Probe System is a vibrating capacitor technique used to measure the change in work function of metals, semiconductors and liquids. The Kelvin method has extremely high surface sensitivity (<0.1 meV, typically corresponding to 10-3of an adsorbate layer) and is completely non-damaging, even to the most sensitive adsorbates. It enjoys wide ranging applications in physics, bio-chemistry, engineering and, most recently, as a UHV surface analysis technique.
- The Kelvin Probe design is 100% UHV compatible. It features a completely shielded driver, vastly improved signal detection methods and optional computer-controlled probe positioning. These innovations, combined with the non-contact, non-destructive nature of its measurement, make the Kelvin Probe system an ideal tool in the study of thin films, adsorption kinetics, work function topographies, surface photo-voltage spectroscopy, phase transitions, surface stress and similar phenomena.