| Flexible
and Easy to Use
This compact electron-beam evaporator is a UHV-compatible source for the
controlled deposition of metals, some semiconductors and insulators. Due
to its small size and 2¾" (70 mm) CF flange mounting, it fits almost
any existing UHV chamber. It is easy to use and maintain, includes water
cooling, an integral shutter, all electrical and mechanical feedthroughs.
Crucible
or Solid
Evaporation is stimulated
by electron bombardment of either a refractory crucible (various materials
available) which contains the evaporant or a solid rod/wire with up to
1000 VDC @ 125 mA (125 watts). The material to be evaporated is centered
in an easily-replaceable filament which has an infinitely-adjustable power
of 0-12 Volts at 0-12 Amps. The user can replenish evaporated material
without dismounting the entire source. An optional linear drive which
moves the evaporant relative to the filament provides a focus adjustment
for the electron beam. There are filament current and beam current / voltage
displays via dual meters on the front panel of the control unit. The evaporator
is also available with an optional linear drive for precise positioning
of the crucible or rod evaporant.
Flux
Monitor
A small electrode
in the flux of evaporated material collects ions present in the partially
ionized environment. After initial calibration, this feature allows quick
and easy return to known deposition rates.
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